The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
May. 31, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Niyaz Khusnatdinov, Round Rock, TX (US);
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A planarization system for forming a formable material film on a substrate by using a superstrate is provided. The superstrate has a first side that comes into contact with the formable material in a case where the superstrate is stacked with the substrate, and a second side opposite to the first side. The planarization system has a first conductive portion at the second side of the superstrate and a second conductive portion at the side of the superstrate. Both the first conductive portion and the second conductive portion are grounded during a separation process to separate the superstrate from the formable material on the substrate.