The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Aug. 22, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A pattern forming method using a photo-nanoimprint process on each of a plurality of shot areas: a step () of laying a layer of a curable composition (A); a step () of dispensing liquid droplets of a curable composition (A) dropwise discretely onto the layer of (A); a step () of sandwiching a layer obtained by partially mixing (A) and (A), between a mold and the substrate; a step () of irradiating the layer with light to cure the layer; and a step () of releasing the mold from the layer of (A) and (A), in which when steps from the step () to the step () are collectively called an imprinting step [Im], in a time period from an end of the step () to a beginning of the step [Im] in one shot, the step () or the step [Im] is performed on another shot area.