The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2024
Filed:
Nov. 30, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Niyaz Khusnatdinov, Round Rock, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method of forming a photo-cured layer on a substrate can comprise using a first photocurable composition and a second photocurable composition, wherein both photocurable compositions may contain the same types of polymerizable monomers but in different concentration ratios. The concentration ratios of the monomers in each of the two photocurable compositions can be adapted that the uneven loss of one type of monomer from the first photocurable composition due to unwanted evaporation in certain regions of the substrate may be compensated by the second photocurable composition, which contains a higher amount of said monomer. The two photocurable compositions can further be adapted to easily merge to a combined layer with a very even distribution of the polymerizable monomers. This may allow forming photo-cured layers having an excellent homogeneous material structure throughout the layer.