The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Mar. 14, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Logan L. Simpson, Coupland, TX (US);
Steven Wayne Burns, Austin, TX (US);
Jason Battin, Pflugerville, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Christopher Ellis Jones, Austin, TX (US);
Craig William Cone, Austin, TX (US);
Wei Zhang, Austin, TX (US);
James W. Irving, Austin, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.