Austin, TX, United States of America

Sidlgata V Sreenivasan

USPTO Granted Patents = 143 


 

Average Co-Inventor Count = 2.7

ph-index = 29

Forward Citations = 3,390(Granted Patents)

Forward Citations (Not Self Cited) = 2,780(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 2005-2025

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Areas of Expertise:
Nanoscale Thin Film Deposition
Nanoimprint Lithography
Heterogeneous Integration
3D Integrated Circuits
Programmable Films
Catalyst Influenced Etching
Nanostructured Solar Cells
Precision Nanoscale Manufacturing
Pattern Transfer Techniques
Adaptive Nanotopography
Wafer-Scale Fabrication
Multi-Tier Nanostructures
143 patents (USPTO):Explore Patents

Title: Sidlgata V Sreenivasan - Innovator in Semiconductor Planarization and Imprint Lithography

Introduction:

Sidlgata V Sreenivasan is a renowned innovator based in Austin, TX, known for his significant contributions to semiconductor planarization and imprint lithography. With an impressive portfolio of 135 patents, Sreenivasan has been instrumental in advancing technologies in the semiconductor industry. This article aims to explore his latest patents, career highlights, collaborations, and contributions to the field.

Latest Patents:

Sreenivasan's recent patents include "Wafer-scale Programmable Films for Semiconductor Planarization" and "Roll-to-Roll Programmable Film Imprint Lithography." These patents highlight his groundbreaking work in fabricating patterns on substrates and improving the manufacturing processes in the semiconductor industry.

The first patent focuses on an inverse optimization scheme that determines process parameters to achieve a desired film thickness in a liquid resist formulation. Various techniques such as inkjet dispensing, slot die coating, and spin-coating are employed to achieve a uniformly coated substrate with the liquid resist formulation. The film is then cured, leaving a polymerized film on the substrate.

The second patent introduces a novel method for fabricating patterns on flexible substrates using a roll-to-roll configuration. By dispensing drops of a monomer diluted in a solvent on the substrate, a liquid resist formulation is formed. After evaporating the solvent, the film is selectively evaporated to create a non-uniform and continuous film on the substrate. The mold is then filled and the film is cross-linked and separated, resulting in a polymerized film.

Career Highlights:

Sreenivasan's career has been marked by significant achievements in both academia and industry. He has held positions at esteemed organizations, including Molecular Imprints, Inc., and the University of Texas System. While working at these institutions, he has consistently pushed the boundaries of technology to improve semiconductor manufacturing processes.

Collaborations:

Throughout his career, Sreenivasan has collaborated with numerous experts and peers in the semiconductor field. One notable collaborator is Byung-Jin Choi, who has worked alongside Sreenivasan on projects related to semiconductor planarization and imprint lithography. Their combined expertise has contributed to innovative solutions and advancements in the industry.

Conclusion:

Sidlgata V Sreenivasan stands out as a leading innovator in the field of semiconductor planarization and imprint lithography. With an extensive portfolio of patents and a career spanning academia and industry, Sreenivasan's contributions have played a crucial role in advancing manufacturing processes in the semiconductor industry. His groundbreaking work continues to inspire and pave the way for future innovations in the field.

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