The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2024

Filed:

Feb. 25, 2021
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Sidlgata V. Sreenivasan, Austin, TX (US);

Parth Pandya, Austin, TX (US);

David Choi, Austin, TX (US);

Shrawan Singhal, Austin, TX (US);

Lawrence Dunn, Austin, TX (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/14 (2006.01); B05D 3/06 (2006.01); B29D 11/00 (2006.01); B32B 37/00 (2006.01); B41J 2/01 (2006.01); B82Y 35/00 (2011.01); G01B 13/22 (2006.01);
U.S. Cl.
CPC ...
B05D 3/148 (2013.01); B05D 3/067 (2013.01); B05D 3/147 (2013.01); B29D 11/00432 (2013.01); B29D 11/0073 (2013.01); B32B 37/0038 (2013.01); B41J 2/01 (2013.01); B82Y 35/00 (2013.01); G01B 13/22 (2013.01);
Abstract

A method and system for nanoscale precision programmable profiling on substrates. Profiling material is dispensed on a substrate or a superstrate. The superstrate is brought in contact with the substrate. The profiling material is then cured after bringing the superstrate in contact with the substrate. The superstrate is separated from the substrate after curing. An optical metrology of points on the substrate corresponding to the final substrate profile is then performed.


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