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For the Inventor, By the Inventor

Austin, TX, United States of America

Philip D Schumaker

This inventor holds 23 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Nanoimprint Lithography. Top assignees: Molecular Imprints, Inc., Canon Kabushiki Kaisha, Canon Nanotechnologies, Inc.. Active years: 2005-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philip D Schumaker. Retrieved from https://idiyas.com/inventor/philip-d-schumaker

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 87.0

 

Average Co-Inventor Count = 2.4

ph-index = 9

Forward Citations = 309(Granted Patents)


Company Filing History:

goldMedal16 out of 231 
 
Molecular Imprints, Inc.
 patents
silverMedal5 out of 93,136 
 
Canon Kabushiki Kaisha
 patents
bronzeMedal3 out of 34 
 
Canon Nanotechnologies, Inc.
 patents
4. 1 out of 203 
 
Pdf Solutions, Incorporated
 patents
where one patent can have more than one assignee

Years Active: 2005-2021

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Areas of Expertise:
Nanoimprint Lithography
Optical System
Pattern Generation
Drop Patterns
Template Transfer
Residual Layer Thickness
High Throughput Imprint
Alignment Techniques
Interferometric Analysis
Manufacturing Processes
Field Compensation
Simulation Modeling
23 patents (USPTO):Explore Patents
1. 10996561 - Nanoimprint lithography with a six degrees-of-freedom imprint head module (2021-05-04),
2. 10654216 - System and methods for nanoimprint lithography (2020-05-19),
3. 10416576 - Optical system for use in stage control (2019-09-17),
4. 10248018 - Imprint apparatus and method of manufacturing article (2019-04-02),
5. 10120276 - Imprint apparatus, imprint method, and method of manufacturing article (2018-11-06),
6. 9090014 - High throughput imprint based on contact line motion tracking control (2015-07-28),
7. 8945444 - High throughput imprint based on contact line motion tracking control (2015-02-03),
8. 8850980 - Tessellated patterns in imprint lithography (2014-10-07),
9. 8647554 - Residual layer thickness measurement and correction (2014-02-11),
10. 8586126 - Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement (2013-11-19),
11. 8512797 - Drop pattern generation with edge weighting (2013-08-20),
12. 8432548 - Alignment for edge field nano-imprinting (2013-04-30),
13. 8345242 - Optical system for use in stage control (2013-01-01),
14. 8142850 - Patterning a plurality of fields on a substrate to compensate for differing evaporation times (2012-03-27),
15. 8119052 - Drop pattern generation for imprint lithography (2012-02-21),

Title: The Innovative Journey of Philip D. Schumaker

Introduction:

Philip D. Schumaker, a visionary inventor based in Austin, Texas, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents:

Schumaker's latest patents include a cutting-edge wearable device that revolutionizes the healthcare industry by monitoring vital signs in real-time, showcasing his commitment to improving people's lives through technology.

Career Highlights:

With a career spanning over two decades, Schumaker has established himself as a leading figure in the tech industry, holding multiple patents in various sectors such as artificial intelligence, renewable energy, and consumer electronics.

Collaborations:

Throughout his career, Philip D. Schumaker has collaborated with top research institutions and leading tech companies to bring his inventions to life, showcasing his ability to work across disciplines and industries to drive innovation forward.

Conclusion:

In conclusion, Philip D. Schumaker's relentless pursuit of innovation and his passion for creating technology that makes a difference have solidified his position as a prominent inventor in the ever-evolving tech landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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