The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Jul. 13, 2010
Applicants:
Christopher Ellis Jones, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Stephen C. Johnson, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Pankaj B. Lad, DeSoto, TX (US);
Inventors:
Christopher Ellis Jones, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Stephen C. Johnson, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Pankaj B. Lad, DeSoto, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B27N 3/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.