The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Mar. 30, 2007
Applicants:
Sidlgata V. Sreenivasan, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Ian M. Mcmackin, Austin, TX (US);
Inventors:
Sidlgata V. Sreenivasan, Austin, TX (US);
Philip D. Schumaker, Austin, TX (US);
Ian M. McMackin, Austin, TX (US);
Assignee:
Canon Nanotechnologies, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); H01L 21/02 (2006.01); G03F 9/00 (2006.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); G03B 27/42 (2006.01); G03B 27/62 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03B 27/62 (2013.01); G03F 9/7084 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); G03F 9/7076 (2013.01); G03B 27/42 (2013.01); G03F 9/7042 (2013.01); G03F 9/00 (2013.01); B82Y 10/00 (2013.01);
Abstract
The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.