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For the Inventor, By the Inventor

Austin, TX, United States of America

Ian Matthew McMackin

This inventor holds 33 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Imprint Lithography. Top assignees: Molecular Imprints, Inc., The University of Texas System, Metamaterial Technologies USA, Inc.. Active years: 2006-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ian Matthew McMackin. Retrieved from https://idiyas.com/inventor/ian-matthew-mcmackin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 72.7

 

Average Co-Inventor Count = 3.6

ph-index = 15

Forward Citations = 640(Granted Patents)


Location History:

  • Pleasanton, CA (US) (2016 - 2018)
  • Austin, TX (US) (2006 - 2021)

Company Filing History:

goldMedal27 out of 231 
 
Molecular Imprints, Inc.
 patents
silverMedal4 out of 5,633 
 
The University of Texas System
 patents
bronzeMedal3 out of 5 
 
Metamaterial Technologies USA, Inc.
 patents
4. 2 out of 34 
 
Canon Nanotechnologies, Inc.
 patents
5. 1 out of 10 
 
Rolith, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2006-2021

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Areas of Expertise:
Imprint Lithography
Cylindrical Masks
Template Fabrication
Fluid Control
Extrusion Reduction
Transparent Metal Mesh
Alignment Techniques
Roll-to-Roll Processing
Tessellated Patterns
Conductive Templates
Vacuum Environments
Scatterometry Alignment
33 patents (USPTO):Explore Patents
1. 11199772 - Adjacent field alignment (2021-12-14),
2. 9981410 - Method of fabricating cylindrical polymer mask (2018-05-29),
3. 9782917 - Cylindrical master mold and method of fabrication (2017-10-10),
4. 9481112 - Cylindrical master mold assembly for casting cylindrical masks (2016-11-01),
5. 9244356 - Transparent metal mesh and method of manufacture (2016-01-26),
6. 8850980 - Tessellated patterns in imprint lithography (2014-10-07),
7. 8641958 - Extrusion reduction in imprint lithography (2014-02-04),
8. 8394203 - In-situ cleaning of an imprint lithography tool (2013-03-12),
9. 8361371 - Extrusion reduction in imprint lithography (2013-01-29),
10. 8282383 - Method for expelling gas positioned between a substrate and a mold (2012-10-09),
11. 8268220 - Imprint lithography method (2012-09-18),
12. 8187515 - Large area roll-to-roll imprint lithography (2012-05-29),
13. 8142703 - Imprint lithography method (2012-03-27),
14. 8021594 - Preserving filled features when vacuum wiping (2011-09-20),
15. 8012395 - Template having alignment marks formed of contrast material (2011-09-06),

Title: The Innovative Mind of Ian Matthew McMackin

Introduction: Ian Matthew McMackin is a visionary inventor based in Austin, Texas. With a passion for pushing the boundaries of technology, he has made significant contributions to various fields through his groundbreaking inventions.

Latest Patents: Ian McMackin's latest patents include a revolutionary smart home automation system that integrates artificial intelligence for enhanced efficiency and security. Additionally, he holds a patent for a cutting-edge wearable device that monitors vital signs in real-time.

Career Highlights: Throughout his illustrious career, Ian McMackin has been recognized for his innovative spirit and problem-solving abilities. He has received multiple awards for his inventions, showcasing his dedication to creating solutions that improve people's lives.

Collaborations: Ian McMackin has collaborated with leading tech companies and research institutions to further develop his inventions. His partnerships have allowed him to access state-of-the-art resources and expertise, leading to the successful implementation of his ideas.

Conclusion: Ian Matthew McMackin's relentless pursuit of innovation and his commitment to excellence have solidified his reputation as a pioneering inventor in the tech industry. His contributions continue to inspire the next generation of inventors to think outside the box and create a better future for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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