Molecular Imprints, Inc.

University of Texas System

Metamaterial Technologies Usa, Inc.

Canon Nanotechnologies, Inc.

Rolith, Inc.

Ian Matthew McMackin

Pankaj B Lad

Sidlgata V Sreenivasan

Byung-Jin Choi

Frank Y Xu

Van Nguyen Truskett

Michael P C Watts

Daniel Babbs

Boris Kobrin

Ronald D Voisin

Nicholas A Stacey

Edward Brian Fletcher

Duane J Voth

Gerard M Schmid

Niyaz Khusnatdinov

Anshuman Cherala

Dwayne L LaBrake

Steven C Shackleton

Christopher Ellis Jones

Mathew P C Watts

Joseph G Perez

Bruce J Richardson

Mario Johannes Meissl

Byung Jin Choi

Philip D Schumaker

Shrawan Singhal

Xiaoming Lu

Douglas J Resnick

Kosta S Selinidis

Norman E Schumaker

David C Wang

Ecron D Thompson

Yeong-Jun Choi

Christopher J Mackay

Christopher Mark Melliar-Smith

Wesley D Martin

Phillip D Schumaker

Oliver Seitz

Mukti Aryal

Wesley Martin

Bryant Grigsby

Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.

Adjacent field alignment

A cylindrical mask may be fabricated using a hollow casting cylinder and a mask cylinder. The casting cylinder has an inner diameter that is larger than the outer diameter of the mask cylinder. The casting and mask cylinders are coaxially assembled and a liquid polymer inserted in a space surrounding the mask cylinder between the inner surface of the casting cylinder and the outer surface of the mask cylinder. After curing the liquid polymer, the casting cylinder is removed. A surface of the cured polymer can be patterned. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Method of fabricating cylindrical polymer mask

Aspects of the present disclosure describe cylindrical molds that may be used to produce cylindrical masks for use in lithography. A structured porous layer may be deposited on an interior surface of a cylinder. A radiation-sensitive material may be deposited over the porous layer in order to fill pores formed in the layer. The radiation-sensitive material in the pores may be cured by exposing the cylinder with a light source. The uncured resist and porous layer may be removed, leaving behind posts on the cylinder's interior surface. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Cylindrical master mold and method of fabrication

Aspects of the present disclosure include a cylindrical master mold assembly having a cylindrical patterned component with a first diameter and a sacrificial casting component with a second diameter. The component with the smaller radius may be co-axially inserted into the interior of the component with the larger radius. Patterned features may be formed on the interior surface of the cylindrical patterned component that faces the sacrificial casting component. The sacrificial casting component may be removed once a cast polymer has been cured to allow the polymer to be released. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Cylindrical master mold assembly for casting cylindrical masks

Embodiments of the present disclosure include a metal mesh structure and a method of fabrication thereof. The metal mesh structure includes a metal mesh formed on a substrate. The metal mesh is a 2D or 3D pattern of lines. The lines in the first and second set are characterized by a linewidth that is less than 2 microns. Such metal mesh structures are fabricated through rolling mask lithography. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Transparent metal mesh and method of manufacture

The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.

Tessellated patterns in imprint lithography

Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

Extrusion reduction in imprint lithography

Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

In-situ cleaning of an imprint lithography tool

The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.

Method for expelling gas positioned between a substrate and a mold

Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.

Imprint lithography method

Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.

Large area roll-to-roll imprint lithography

A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.

A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.

Preserving filled features when vacuum wiping

Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.

Template having alignment marks formed of contrast material

Growing community of inventors

Austin, TX, United States of America

Ian Matthew McMackin