The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Jun. 22, 2009
Steven C. Shackleton, Austin, TX (US);
Pankaj B. Lad, DeSoto, TX (US);
Ian Matthew Mcmackin, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Steven C. Shackleton, Austin, TX (US);
Pankaj B. Lad, DeSoto, TX (US);
Ian Matthew McMackin, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.