The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
May. 12, 2009
Applicants:
Kosta S. Selinidis, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Gerard M. Schmid, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Ian Matthew Mcmackin, Austin, TX (US);
Inventors:
Kosta S. Selinidis, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Gerard M. Schmid, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Ian Matthew McMackin, Austin, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 11/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.