The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Nov. 07, 2014
Applicants:
Canon Nanotechnologies, Inc., Austin, TX (US);
Toshiba Corporation, Tokyo, JP;
Inventors:
Mario Johannes Meissl, Austin, TX (US);
Anshuman Cherala, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Seth J. Bamesberger, Austin, TX (US);
Assignee:
Canon Nanotechnologies, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/60 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70708 (2013.01); G03F 7/0002 (2013.01);
Abstract
Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.