The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Feb. 21, 2013
Byung-jin Choi, Austin, TX (US);
SE Hyun Ahn, Austin, TX (US);
Mahadevan Ganapathisubramanian, Cedar Park, TX (US);
Michael N. Miller, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Se Hyun Ahn, Austin, TX (US);
Mahadevan GanapathiSubramanian, Cedar Park, TX (US);
Michael N. Miller, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.