Location History:
- Ann Arbor, MI (US) (2011)
- Austin, TX (US) (2014 - 2017)
- Mountain View, CA (US) (2017)
Company Filing History:
3 out of 230 
2 out of 3,390 
2 out of 34 Years Active: 2011-2017
Title: **Se Hyun Ahn: A Pioneer in Polymer-Based Imprint Lithography**
Introduction
Se Hyun Ahn is an innovative inventor based in Austin, TX, with a notable record of five patents to his name. His work primarily focuses on advancements in imprint lithography techniques, which play a crucial role in the fabrication of nanostructures with high precision.
Latest Patents
Among his recent patents, Se Hyun Ahn has developed methods for nano imprinting using reusable polymer templates with metallic or oxide coatings. These advanced templates are designed to enhance fluid spreading and filling, ensuring effective operation even without purging gases. The longevity of these templates makes them ideal for sustained use in various applications. Additionally, his patent related to large area imprint lithography showcases methods for patterning polymerizable materials that can be dispensed on flexible or flat substrates. This innovation allows for the efficient transfer of patterns from a master template onto flexible substrates, expanding the potential for large-scale applications in diverse fields.
Career Highlights
Se Hyun Ahn has built a distinguished career by contributing to renowned organizations such as Molecular Imprints, Inc. and the University of Michigan. His experiences at these institutions have enriched his knowledge and expertise in imprint lithography, helping him make significant strides in the area of polymer-based patterning.
Collaborations
Throughout his professional journey, Se Hyun Ahn has collaborated with talented individuals including Byung-Jin Choi and Lingjie Jay Guo. These partnerships have fostered creativity and innovation, facilitating advancements in their shared fields of interest.
Conclusion
In conclusion, Se Hyun Ahn continues to push the boundaries of polymer-based imprint lithography with his inventive approaches. His contributions not only enhance the efficiency of manufacturing processes but also aid in lowering costs and increasing throughput in various applications. As he forges ahead in his career, his work promises to leave a lasting impact on the field of nanotechnology.