The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Apr. 09, 2008
Applicants:
Lingjie Jay Guo, Ann Arbor, MI (US);
SE Hyun Ahn, Ann Arbor, MI (US);
Inventors:
Lingjie Jay Guo, Ann Arbor, MI (US);
Se Hyun Ahn, Ann Arbor, MI (US);
Assignee:
The Regents Of The University Of Michigan, Ann Arbor, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Apparatus and methods for a nano-patterning process to fabricate nanostructures. A roller type mold is used to continuously imprint nanostructures onto a flexible web or a rigid substrate. The process includes a coating and an imprinting module, which rotate the web synchronously. Liquid resist materials are used for imprinting and the patterns are set by thermal or UV curing. The process is used to produce bilayer metal wire-grid polarizers, organic solar cells, and organic light emitting diodes.