The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Apr. 15, 2010
SE Hyun Ahn, Austin, TX (US);
Lingjie Jay Guo, Ann Arbor, MI (US);
Se Hyun Ahn, Austin, TX (US);
Lingjie Jay Guo, Ann Arbor, MI (US);
The Regents of the University of Michigan, Ann Arbor, MI (US);
Abstract
Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays and bio-sensors. A Dynamic Nano-Inscribing (Dynamic Nano-Inscribing) technique is disclosed for directly creating large-area, truly continuous nano-grating patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high speed (10 cm/sec). Dynamic Nano-Inscribing is carried out under either ambient temperature or with a brief heating time on the order of ten microseconds, which minimizes damage on UV or thermo-sensitive functional materials.