The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Jul. 11, 2014
Canon Nanotechnologies, Inc., Austin, TX (US);
Toshiba Corporation, Tokyo, JP;
Edward Brian Fletcher, Austin, TX (US);
Gerard M. Schmid, Albany, NY (US);
Se-Hyuk Im, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Yeshwanth Srinivasan, Austin, TX (US);
Weijun Liu, Cedar Park, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Abstract
Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.