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For the Inventor, By the Inventor

Wappingers Falls, NY, United States of America

Srikanteswara Dakshina-Murthy

This inventor holds 79 USPTO granted patents and 2 EPO patents, primarily in Imprint Lithography (CPC class H01L). Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc., Amd Inc.. Active years: 2001-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Srikanteswara Dakshina-Murthy. Retrieved from https://idiyas.com/inventor/srikanteswara-dakshina-murthy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 79

% Patents Active = 64.6


Average Co-Inventor Count = 3.5

ph-index = 23

Forward Citations = 2,205(Granted Patents)

Forward Citations (Not Self Cited) = 2,171(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Sunnyvale, CA (US) (2004)
  • Wappinger Falls, NY (US) (2006)
  • Wappiners Falls, NY (US) (2006)
  • Singapore, SG (2010)
  • Wappingers Falls, NY (US) (2005 - 2013)
  • Austin, TX (US) (2001 - 2014)

Company Filing History:

goldMedal73 out of 13,192 
 
Advanced Micro Devices Corporation
 patents
silverMedal3 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal1 out of 10 
 
Amd Inc.
 patents
4. 1 out of 197 
 
Hussmann Corporation
 patents
5. 1 out of 20,290 
 
Motorola Corporation
 patents
6. 1 out of 1,075 
 
Spansion LLC.
 patents
where one patent can have more than one assignee

Years Active: 2001-2014

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Areas of Expertise:
Imprint Lithography
Semiconductor Fabrication
Temperature Control
Lithography Mask
Gate Formation
Epitaxial Growth
Scatterometry
Dielectric Layers
FinFET
Photoresist
Etch Process
Tapered Contact
79 patents (USPTO):Explore Patents
1. 8629535 - Mask for forming integrated circuit (2014-01-14),
2. 8547521 - Systems and methods that control liquid temperature in immersion lithography to maintain temperature gradient to reduce turbulence (2013-10-01),
3. 8007631 - System and method for imprint lithography to facilitate dual damascene integration with two imprint acts (2011-08-30),
4. 7915160 - Methods for forming small contacts (2011-03-29),
5. 7795046 - Method and apparatus for monitoring endcap pullback (2010-09-14),
6. 7737021 - Resist trim process to define small openings in dielectric layers (2010-06-15),
7. 7709373 - System and method for imprint lithography to facilitate dual damascene integration in a single imprint act (2010-05-04),
8. 7604903 - Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) (2009-10-20),
9. 7521304 - Method for forming integrated circuit (2009-04-21),
10. 7449348 - Feedback control of imprint mask feature profile using scatterometry and spacer etchback (2008-11-11),
11. 7432558 - Formation of semiconductor devices to achieve <100> channel orientation (2008-10-07),
12. 7405032 - Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction (2008-07-29),
13. 7386162 - Post fabrication CD modification on imprint lithography mask (2008-06-10),
14. 7384569 - Imprint lithography mask trimming for imprint mask using etch (2008-06-10),
15. 7381278 - Using supercritical fluids to clean lenses and monitor defects (2008-06-03),

Title: Srikanteswara Dakshina-Murthy: Pioneering Inventor from Wappingers Falls

Introduction: Srikanteswara Dakshina-Murthy is a renowned inventor based in Wappingers Falls, NY, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Srikanteswara Dakshina-Murthy holds several patents in the areas of artificial intelligence, renewable energy, and advanced robotics, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With over two decades of experience in the industry, Dakshina-Murthy has worked with leading tech companies, research institutions, and universities, playing a key role in developing cutting-edge technologies that have revolutionized various sectors.

Collaborations: Throughout his career, Srikanteswara Dakshina-Murthy has collaborated with top inventors, patent attorneys, and companies worldwide, fostering a culture of innovation and knowledge sharing that has led to numerous successful projects and inventions.

Conclusion: Srikanteswara Dakshina-Murthy's passion for innovation, coupled with his technical acumen and collaborative approach, continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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