The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2008

Filed:

Aug. 02, 2004
Applicants:

Srikanteswara Dakshina-murthy, Wappingers Falls, NY (US);

Bhanwar Singh, Morgan Hill, CA (US);

Ramkumar Subramanian, Sunnyvale, CA (US);

Inventors:

Srikanteswara Dakshina-Murthy, Wappingers Falls, NY (US);

Bhanwar Singh, Morgan Hill, CA (US);

Ramkumar Subramanian, Sunnyvale, CA (US);

Assignee:

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 21/30 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are photolithographic systems and methods, and more particularly systems and methodologies that enhance imprint mask feature resolution. An aspect generates feedback information that facilitates control of imprint mask feature size and resolution via employing a scatterometry system to detect resolution enhancement need, and decreasing imprint mask feature size and increasing resolution of the imprint mask via a trim etch procedure.


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