The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Jun. 23, 2004
Srikanteswara Dakshina-murthy, Wappingers Falls, NY (US);
Bhanwar Singh, Morgan Hill, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Srikanteswara Dakshina-Murthy, Wappingers Falls, NY (US);
Bhanwar Singh, Morgan Hill, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Advanced Micro Devices, Inc, Austin, TX (US);
Abstract
The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate compensating for imprint mask critical dimension error(s). An aspect of the invention generates feedback information that facilitates control of imprint mask critical dimension via employing a scatterometry system to detect imprint mask critical dimension error, and mitigating the error via a spacer etchback procedure.