Clifton Park, NY, United States of America

Ravi Prakash Srivastava

This inventor holds 35 USPTO granted patents and 8 published patent applications and 1 EPO patent, primarily in Photonics Integration. Top assignees: Globalfoundries Inc., Globalfoundries U.S. Inc., Advanced Micro Devices Corporation. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ravi Prakash Srivastava. Retrieved from https://idiyas.com/inventor/ravi-prakash-srivastava

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35 

% Patents Active = 71.4

 

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 103(Granted Patents)


Location History:

  • Beacon, NY (US) (2011)
  • Fishkill, NY (US) (2012 - 2015)
  • Clifton Park, NY (US) (2015 - 2022)

Company Filing History:


Years Active: 2011-2026

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Areas of Expertise:
Waveguide Escalators
Photonics Chip
Integrated Circuits
Multi-Substrate Coupling
Optical Phase Shifter
Lithographic Patterning
Back End Of Line
Interconnect Formation
Metal Filling Processes
Soft-Fail Reduction
Spacer Materials
Damascene Structures
35 patents (USPTO):Explore Patents

Title: Innovations of Ravi Prakash Srivastava

Introduction

Ravi Prakash Srivastava is a distinguished inventor based in Clifton Park, NY, who has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With an impressive portfolio consisting of 28 patents, Ravi has been at the forefront of developing advanced technologies that enhance the efficiency and effectiveness of manufacturing processes in the semiconductor industry.

Latest Patents

Among his latest patents, Ravi has developed a method for multiple patterning with mandrel cuts defined by block masks. This invention involves the strategic placement of a hardmask over an interlayer dielectric layer, followed by the formation of a mandrel. The inventive process allows for selective exposure of specific sections of the mandrel, facilitating the creation of distinct mandrel lines. These patterns are crucial for advanced semiconductor devices, as they lay the foundation for subsequent etching processes that transfer the pattern to hardmask and dielectric layers.

Another noteworthy invention is related to metal on metal multiple patterning. This patent describes a structure that incorporates a first metal layer patterned as a mandrel, overlaid with a dielectric spacer and a second metal layer. This innovative approach further amplifies the capabilities for creating complex structures essential for high-performance semiconductor applications.

Career Highlights

Ravi has built his career at leading companies in the semiconductor industry, notably Globalfoundries Inc. and Globalfoundries Singapore Pte. Ltd. His work at these organizations has positioned him as a key contributor to innovative manufacturing techniques, particularly those involving complex wiring and layer structures that are vital for modern electronics.

Collaborations

Throughout his career, Ravi has collaborated with numerous professionals, including notable colleagues like Sunil Kumar Singh and Akshey Sehgal. These partnerships have facilitated a productive exchange of ideas and fostered a creative environment, resulting in several groundbreaking inventions in the semiconductor space.

Conclusion

Ravi Prakash Srivastava exemplifies the spirit of innovation in the semiconductor industry through his extensive patent portfolio and collaborative efforts. His contributions not only advance technology but also inspire future developments in the field, making him a prominent figure among modern inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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