The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Nov. 08, 2023
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Ravi Prakash Srivastava, Clifton Park, NY (US);

Matthew Charles Gorfien, Saratoga Springs, NY (US);

Assignee:

GLOBALFOUNDRIES U.S. Inc., Malta, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 99/00 (2026.01); H10W 72/90 (2026.01); H10W 80/00 (2026.01);
U.S. Cl.
CPC ...
H10W 99/00 (2026.01); H10W 72/90 (2026.01); H10W 72/9445 (2026.01); H10W 72/951 (2026.01); H10W 72/952 (2026.01); H10W 80/312 (2026.01); H10W 80/327 (2026.01);
Abstract

A method for hybrid bonding a first semiconductor substrate to a second semiconductor substrate includes forming a first plurality of metal pads on a face of the first substrate, forming a second plurality of metal pads on a face of the second substrate, selectively forming a first dielectric layer over a first insulating material of the first substrate, selectively forming a second dielectric layer over a second insulating material of the second substrate, placing the face of the first substrate against the face of the second substrate so that the first dielectric layer contacts the second dielectric layer, and heating the first substrate and the second substrate to bond the first plurality of metal pads to the second plurality of metal pads. The first and second dielectric layers may be formed by an area selective deposition process.


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