The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Nov. 27, 2022
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Shesh Mani Pandey, Saratoga Springs, NY (US);

Yusheng Bian, Ballston Lake, NY (US);

Ravi Prakash Srivastava, Clifton Park, NY (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2005.12); G02B 6/122 (2005.12); G02B 6/136 (2005.12);
U.S. Cl.
CPC ...
G02B 6/12004 (2012.12); G02B 6/122 (2012.12); G02B 6/1228 (2012.12); G02B 6/136 (2012.12);
Abstract

Structures and methods implement an enlarged multilayer nitride waveguide. The structure may include an inter-level dielectric (ILD) layer over a substrate. A first enlarged multilayer nitride waveguide is positioned in the ILD layer in a region of the substrate. A second multilayer nitride waveguide may also be provided in the ILD layer. A lower cladding layer defines a lower surface of the nitride waveguide(s). The lower cladding layer has a lower refractive index than the nitride waveguide(s). Additional lower refractive index cladding layers can be provided on the upper surface and/or sidewalls of the nitride waveguide(s). The enlarged nitride waveguide may be implemented with other conventional silicon and nitride waveguides.


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