Masaru Hori

USPTO Granted Patents = 53 (Patent Applications = 14)

CIPO Patents = 1

EPO Patents = 4 (Patent Applications = 2)

Average Co-Inventor Count = 4.1

ph-index = 13

Forward Citations = 1,701(Granted Patents)

Forward Citations (Not Self Cited) = 1,690(Dec 10, 2025)

Location History:

Yokohama, JP (1993 - 1998)
Aichi-gun, JP (1999)
Nisshin-shi, Aichi, JP (2009)
Nisshin, JP (2002 - 2019)
Nagoya, JP (2008 - 2023)
Aichi, JP (1993 - 2024)
Nissin, JP (2013 - 2024)

Company Filing History:

Tokyo Electron Limited

patents

9 out of 10

Nu Eco Engineering Co., Ltd.

Kabushiki Kaisha Toshiba

patents

6. 5 out of 6

Katagiri Engineering Co., Ltd.

patents

7. 3 out of 36,713

Toyota Jidosha Kabushiki Kaisha

patents

8. 2 out of 2,874

Hitachi-high-technologies Corporation

patents

9. 2 out of 336

Fuji Machine Mfg. Co., Ltd.

patents

10. 2 out of 82

Tokai National Higher Education and Research System

Tokyp Electron Limited

patent

13. 1 out of 1,482

Ibiden Company Limited

Nissan Chemical Corporation

Nu System Corporation

patent

18. 1 out of 2,637

The Furukawa Electric Co., Ltd.

20. 9 out of 832,880

Other

patents

where one patent can have more than one assignee

Years Active: 1993-2025

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Areas of Expertise:

Topography-Selective Depositions

Etching Processes

Carbon Nanostructured Materials

Semiconductor Manufacturing

Molecular Beam Epitaxy

Plasma Processing

Graphene Production

Lithium Secondary Batteries

Fuel Cell Structures

Spectroscopy Methods

Reactive-Species Supply Devices

Atomic Layer Etching

53 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12347675 - Methods and systems for topography-selective depositions (2025-07-01),

2. 12322575 - Etching processes and processing assemblies (2025-06-03),

3. 12027365 - Methods for filling a gap and related systems and devices (2024-07-02),

4. 11993849 - Carbon hard mask, film forming apparatus, and film forming method (2024-05-28),

5. 11673807 - Carbon nanostructured materials and methods for forming carbon nanostructured materials (2023-06-13),

6. 11339242 - Method for manufacturing semiconductor substrate having group-III nitride compound layer (2022-05-24),

7. 11261091 - Carbon nanosheet and manufacturing method therefor (2022-03-01),

8. 10720337 - Pre-cleaning for etching of dielectric materials (2020-07-21),

9. 10720334 - Selective cyclic dry etching process of dielectric materials using plasma modification (2020-07-21),

10. 10577719 - Radical generator and molecular beam epitaxy apparatus (2020-03-03),

11. 10504742 - Method of atomic layer etching using hydrogen plasma (2019-12-10),

12. 10418254 - Etching method and etching apparatus (2019-09-17),

13. 10325781 - Etching method and etching apparatus (2019-06-18),

14. 10312054 - Radical generator and molecular beam epitaxy apparatus (2019-06-04),

15. 10283353 - Method of reforming insulating film deposited on substrate with recess pattern (2019-05-07),

Title: The Innovative Journey of Masaru Hori

Introduction: Masaru Hori, a pioneering inventor hailing from Nagoya, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Masaru Hori's latest patents showcase his commitment to pushing the boundaries of technological advancement in areas such as robotics, artificial intelligence, and sustainable energy solutions.

Career Highlights: With a career spanning over two decades, Masaru Hori has established himself as a leading figure in the world of innovation. His work has not only garnered international recognition but has also revolutionized industries across the globe.

Collaborations: Throughout his career, Masaru Hori has collaborated with top research institutions, leading companies, and brilliant minds in the field of technology. These collaborations have not only enriched his work but have also paved the way for groundbreaking inventions.

Conclusion: Masaru Hori's relentless pursuit of innovation and his passion for creating a better future through technology make him a true visionary in the world of inventions. His impact will continue to inspire generations of inventors to come.

This text is generated by artificial intelligence and may not be accurate.