The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Aug. 19, 2016
National University Corporation Nagoya University, Nagoya-shi, JP;
Nu Eco Engineering Co., Ltd., Miyoshi-shi, JP;
Katagiri Engineering Co., Ltd., Yokohama-shi, JP;
Masaru Hori, Nagoya, JP;
Hiroshi Amano, Nagoya, JP;
Hiroyuki Kano, Miyoshi, JP;
Shoji Den, Yokohama, JP;
Koji Yamakawa, Yokohama, JP;
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, Nagoya-Shi, Aichi, JP;
NU ECO ENGINEERING CO., LTD., Miyoshi-Shi, Aichi, JP;
KATAGIRI ENGINEERING CO., LTD., Yokohama-Shi, Kanagawa, JP;
Abstract
A molecular beam epitaxy apparatus includes a radical generator for generating a radical species, a molecular beam cell for generating a molecular beam or an atomic beam, and a vacuum chamber for accommodating a substrate therein, in use, the substrate being irradiated with the radical species and the molecular beam or the atomic beam in vacuum, to thereby form, on the substrate, a crystal of a compound derived from the element of the radical species and the element of the molecular beam or the atomic beam.