The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Sep. 08, 2017
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Kazunori Shinoda, Tokyo, JP;
Satoshi Sakai, Tokyo, JP;
Masaru Izawa, Tokyo, JP;
Nobuya Miyoshi, Tokyo, JP;
Hiroyuki Kobayashi, Tokyo, JP;
Yutaka Kouzuma, Tokyo, JP;
Kenji Ishikawa, Kanagawa, JP;
Masaru Hori, Aichi, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/321 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01L 27/11556 (2017.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
H01L 21/32136 (2013.01); H01L 21/31116 (2013.01); H01L 21/67069 (2013.01); H01L 21/67115 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01);
Abstract
A method for etching a titanium nitride film includes a first process of supplying reactive species, which include hydrogen and fluorine, to a base material including a titanium nitride film on at least a part of a surface, and a second process of vacuum-heating the base material to remove the surface reaction layer that is generated on the surface of the titanium nitride film in the first process.