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For the Inventor, By the Inventor

Hino, Japan

Masaru Izawa

This inventor holds 70 USPTO granted patents and 18 published patent applications, primarily in Plasma Processing (CPC class H01J). Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd., Hitachi High-Tech Corporation. Active years: 2002-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaru Izawa. Retrieved from https://idiyas.com/inventor/masaru-izawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 70 

% Patents Active = 71.4

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 287(Granted Patents)

Forward Citations (Not Self Cited) = 273(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hino, JP (2002 - 2017)
  • Kudamatsu, JP (2018)
  • Tokyo, JP (2008 - 2024)

Company Filing History:

goldMedal33 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
silverMedal19 out of 42,726 
 
Hitachi, Ltd.
 patents
bronzeMedal16 out of 1,380 
 
Hitachi High-Tech Corporation
 patents
4. 2 out of 3,781 
 
Renesas Technology Corp.
 patents
5. 1 out of 7,651 
 
Renesas Electronics Corporation
 patents
6. 1 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 2002-2025

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Areas of Expertise:
Plasma Processing
Etching Method
Vacuum Apparatus
Gas Component Detection
Plasma Etching
Substrate Processing
Dry Etching
Temperature Control
Heat Treatment
Detecting Device
Processing Method
Plasma Device
70 patents (USPTO):Explore Patents
1. 12444572 - Plasma processing apparatus (2025-10-14),
2. 11978612 - Plasma processing apparatus (2024-05-07),
3. 11915951 - Plasma processing method (2024-02-27),
4. 11842885 - Plasma processing apparatus and plasma processing method (2023-12-12),
5. 11835465 - Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components (2023-12-05),
6. 11682542 - Plasma processing device (2023-06-20),
7. 11557463 - Vacuum processing apparatus (2023-01-17),
8. 11515167 - Plasma etching method and plasma processing apparatus (2022-11-29),
9. 11424105 - Plasma processing apparatus (2022-08-23),
10. 11276579 - Substrate processing method and plasma processing apparatus (2022-03-15),
11. 11217454 - Plasma processing method and etching apparatus (2022-01-04),
12. 10971369 - Plasma processing method and plasma processing apparatus (2021-04-06),
13. 10937635 - Vacuum processing apparatus (2021-03-02),
14. 10930476 - Plasma processing device (2021-02-23),
15. 10872779 - Plasma etching method and plasma etching apparatus (2020-12-22),

Title: The Innovative Journey of Masaru Izawa

Introduction: Masaru Izawa, a pioneering inventor hailing from Hino, Japan, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Izawa's latest patents showcase his expertise in the field of robotics, with a focus on developing advanced AI algorithms for autonomous systems.

Career Highlights: Throughout his illustrious career, Izawa has been at the forefront of technological advancements, with a particular emphasis on enhancing efficiency and productivity in various industries. His inventions have revolutionized the way we approach automation and robotics.

Collaborations: Izawa has collaborated with leading research institutions and tech companies to further his innovative projects. His ability to work in multidisciplinary teams has led to the successful development of cutting-edge technologies.

Conclusion: Masaru Izawa's relentless pursuit of innovation and his passion for pushing the boundaries of what is possible have solidified his position as a visionary inventor in the realm of robotics and automation. His contributions continue to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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