Masaru Izawa

This inventor holds 70 USPTO granted patents and 18 published patent applications, primarily in Plasma Processing (CPC class H01J). Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd., Hitachi High-Tech Corporation. Active years: 2002-2025.

USPTO Granted Patents = 70 (Patent Applications = 18)

% Patents Active = 71.4

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 287(Granted Patents)

Forward Citations (Not Self Cited) = 273(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Hino, JP (2002 - 2017)
Kudamatsu, JP (2018)
Tokyo, JP (2008 - 2024)

Company Filing History:

33 out of 2,874

Hitachi-High-Technologies Corporation

Hitachi High-Tech Corporation

patents

4. 2 out of 3,781

Renesas Technology Corp.

patents

5. 1 out of 7,651

Renesas Electronics Corporation

patents

6. 1 out of 834,453

Other

patents

where one patent can have more than one assignee

Years Active: 2002-2025

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Areas of Expertise:

Plasma Processing

Etching Method

Vacuum Apparatus

Gas Component Detection

Plasma Etching

Substrate Processing

Dry Etching

Temperature Control

Heat Treatment

Detecting Device

Processing Method

Plasma Device

70 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12444572 - Plasma processing apparatus (2025-10-14),

2. 11978612 - Plasma processing apparatus (2024-05-07),

3. 11915951 - Plasma processing method (2024-02-27),

4. 11842885 - Plasma processing apparatus and plasma processing method (2023-12-12),

5. 11835465 - Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components (2023-12-05),

6. 11682542 - Plasma processing device (2023-06-20),

7. 11557463 - Vacuum processing apparatus (2023-01-17),

8. 11515167 - Plasma etching method and plasma processing apparatus (2022-11-29),

9. 11424105 - Plasma processing apparatus (2022-08-23),

10. 11276579 - Substrate processing method and plasma processing apparatus (2022-03-15),

11. 11217454 - Plasma processing method and etching apparatus (2022-01-04),

12. 10971369 - Plasma processing method and plasma processing apparatus (2021-04-06),

13. 10937635 - Vacuum processing apparatus (2021-03-02),

14. 10930476 - Plasma processing device (2021-02-23),

15. 10872779 - Plasma etching method and plasma etching apparatus (2020-12-22),

Title: The Innovative Journey of Masaru Izawa

Introduction: Masaru Izawa, a pioneering inventor hailing from Hino, Japan, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Izawa's latest patents showcase his expertise in the field of robotics, with a focus on developing advanced AI algorithms for autonomous systems.

Career Highlights: Throughout his illustrious career, Izawa has been at the forefront of technological advancements, with a particular emphasis on enhancing efficiency and productivity in various industries. His inventions have revolutionized the way we approach automation and robotics.

Collaborations: Izawa has collaborated with leading research institutions and tech companies to further his innovative projects. His ability to work in multidisciplinary teams has led to the successful development of cutting-edge technologies.

Conclusion: Masaru Izawa's relentless pursuit of innovation and his passion for pushing the boundaries of what is possible have solidified his position as a visionary inventor in the realm of robotics and automation. His contributions continue to inspire future generations of inventors and innovators.