Daisuke Hayashi

This inventor holds 96 USPTO granted patents and 7 published patent applications and 2 EPO patents, primarily in Plasma Processing (CPC class H01L21-6831). Top assignees: Tokyo Electron Limited, International Business Machines Corporation, Ykk Corporation. Active years: 2002-2025.

USPTO Granted Patents = 96 (Patent Applications = 7)

% Patents Active = 62.5

EPO Patents = 2 (Patent Applications = 1)

Average Co-Inventor Count = 2.0

ph-index = 13

Forward Citations = 720(Granted Patents)

Forward Citations (Not Self Cited) = 694(Dec 10, 2025)

Inventors with similar research interests:

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Location History:

Meerbusch, DE (2007)
Yamanashi-ken, JP (2002 - 2008)
Musashino, JP (2008 - 2010)
Wuppertal, DE (2013)
Nirasaki, JP (2004 - 2016)
Guangdong, CN (2019)
Kurobe, JP (2021)
Yamanashi, JP (2004 - 2022)
Tokyo, JP (2006 - 2022)
Miyagi, JP (2016 - 2024)
Toyama, JP (2018 - 2024)

Company Filing History:

64 out of 10,837

Tokyo Electron Limited

patents

12 out of 166,159

International Business Machines Corporation

Yokogawa Electric Corporation

patents

5. 1 out of 35

Covalent Materials Corporation

patents

6. 1 out of 58

Nippon Valqua Industries, Ltd.

patents

7. 1 out of 6

Tokyo Electric Limited

patents

where one patent can have more than one assignee

Years Active: 2002-2025

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Areas of Expertise:

Plasma Processing

Plasma Etching

Substrate Support

Magnetic Tape Storage

Snap Button

Temperature Control

Electrostatic Chuck

Text Analysis

Bonding Method

Transfer Device

Mounting Table

Confidential Information

96 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12405753 - Ordering files in magnetic tape storage (2025-09-02),

2. 12191188 - Transfer device, transfer system, and end effector (2025-01-07),

3. 11969060 - Snap button (2024-04-30),

4. 11935731 - Plasma processing apparatus, plasma state detection method, and plasma state detection program (2024-03-19),

5. 11735392 - Plasma processing apparatus (2023-08-22),

6. 11528967 - Male snap button and female snap button (2022-12-20),

7. 11421323 - Stage and electrode member (2022-08-23),

8. 11387080 - Substrate support and plasma processing apparatus (2022-07-12),

9. 11380573 - Structure for automatic in-situ replacement of a part of an electrostatic chuck (2022-07-05),

10. 11380526 - Stage and plasma processing apparatus (2022-07-05),

11. 11373884 - Placing table and plasma treatment apparatus (2022-06-28),

12. 11289356 - Stage and plasma processing apparatus (2022-03-29),

13. 11019886 - Button (2021-06-01),

14. 11011347 - Plasma processing apparatus (2021-05-18),

15. 10986901 - Snap button (2021-04-27),

Title: The Innovative Mind of Daisuke Hayashi

Introduction: Daisuke Hayashi, a pioneering inventor hailing from Nirasaki, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daisuke Hayashi holds several patents in the realm of robotics and artificial intelligence, with his most recent inventions focusing on advanced human-machine interfaces and autonomous systems.

Career Highlights: Throughout his illustrious career, Daisuke Hayashi has worked tirelessly to push the boundaries of technological advancement. His work has not only revolutionized the way we interact with machines but has also paved the way for a future where man and machine can seamlessly coexist.

Collaborations: Daisuke Hayashi has collaborated with leading research institutions and tech companies around the world to further his research and bring his innovative ideas to life. His collaborative spirit and dedication to his craft have earned him the respect and admiration of his peers in the industry.

Conclusion: In conclusion, Daisuke Hayashi stands as a true visionary in the world of technology and innovation. His relentless pursuit of excellence and his passion for pushing the limits of what is possible have solidified his place as a trailblazer in the field of robotics and artificial intelligence.