Nobuya Miyoshi

Title: Nobuya Miyoshi: Innovator in Wafer Processing Technology

Introduction

Nobuya Miyoshi is a prominent inventor based in Tokyo, Japan, known for his significant contributions to wafer processing technology. With a total of 13 patents to his name, he has made remarkable advancements in the field, particularly in methods and apparatuses that enhance the efficiency and effectiveness of wafer processing.

Latest Patents

Miyoshi's latest patents include a wafer processing method and a plasma processing apparatus. The wafer processing method involves irradiating a wafer placed on a sample table with light or electromagnetic waves to heat and remove a compound layer from a film layer on the wafer's surface. This innovative process utilizes reflected light or electromagnetic waves to correct signals indicating changes in intensity, thereby improving the accuracy of the processing. The plasma processing apparatus features a stage for mounting a wafer, a plasma generation chamber, and a dielectric plate member with multiple introduction holes. This design allows for effective plasma generation and precise temperature determination of the wafer during processing.

Career Highlights

Throughout his career, Nobuya Miyoshi has worked with notable companies such as Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. His experience in these organizations has contributed to his expertise in developing advanced technologies for wafer processing.

Collaborations

Miyoshi has collaborated with esteemed colleagues, including Hiroyuki Kobayashi and Yutaka Kouzuma, to further enhance his research and development efforts in the field of wafer processing technology.

Conclusion

Nobuya Miyoshi's innovative work in wafer processing technology has established him as a key figure in the industry. His patents reflect a commitment to advancing the capabilities of wafer processing, making significant contributions to the field.