The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Mar. 17, 2016
Hitachi High-technologies Corporation, Tokyo, JP;
Hiroyuki Kobayashi, Tokyo, JP;
Nobuya Miyoshi, Tokyo, JP;
Kazunori Shinoda, Tokyo, JP;
Kenji Maeda, Tokyo, JP;
Yutaka Kouzuma, Tokyo, JP;
Satoshi Sakai, Tokyo, JP;
Masaru Izawa, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In a vacuum processing apparatus including: a vacuum container including a processing chamber therein; a plasma formation chamber; plate members being arranged between the processing chamber and the plasma formation chamber; and a lamp and a window member being arranged around the plate members, in order that a wafer and the plate members are heated by electromagnetic waves from the lamp, a bottom surface and a side surface of the window member is formed of a member transmitting the electromagnetic waves therethrough.