Location History:
- Kudamatsu, JP (2012)
- Tokyo, JP (2018 - 2024)
Company Filing History:
14 out of 1,146 
6 out of 2,874 
Years Active: 2012-2025
Title: Yutaka Kouzuma: A Pioneer in Plasma Processing Technologies
Introduction
Yutaka Kouzuma, based in Tokyo, Japan, is an esteemed inventor known for his significant contributions to the field of plasma processing. With a robust portfolio of 18 patents, his innovations have had a profound impact on the technological landscape, especially in semiconductor manufacturing and related industries.
Latest Patents
Kouzuma's latest patents showcase his expertise in developing advanced plasma processing apparatuses. One noteworthy invention is a plasma processing apparatus designed to inhibit gas clustering while supplying gas stably. This device features an integrated gas box that adjusts gas flow rates and includes multiple components like gas blocks, a heater for temperature control, and a bypass path to regulate gas pressure.
Another significant patent is a novel plasma processing method that includes a specialized setup for wafer mounting and plasma generation. In this method, a dielectric plate with multiple introduction holes is positioned between the processing and plasma generation chambers, further enhanced by an external IR light source for precise temperature measurements of the wafer during processing. This approach optimizes the heating of wafers and ensures accurate temperature determination through innovative data collection techniques.
Career Highlights
Yutaka Kouzuma has made remarkable advancements during his career, notably through his work at prominent companies, including Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. His roles within these organizations have allowed him to hone his skills and drive the development of cutting-edge technologies.
Collaborations
Throughout his career, Kouzuma has collaborated with notable colleagues such as Hiroyuki Kobayashi and Nobuya Miyoshi. These collaborations have facilitated the exchange of ideas and fostered innovations that have further propelled the industry forward.
Conclusion
In conclusion, Yutaka Kouzuma's remarkable achievements in the realm of plasma processing illustrate his dedication to innovation and excellence. With 18 patents to his name, his contributions continue to shape the future of technology, ensuring more efficient and effective processes in semiconductor manufacturing. His work serves as an inspiration to current and future inventors aiming to push the boundaries of what is possible in modern technology.