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For the Inventor, By the Inventor

Tokyo, Japan

Kazunori Shinoda

This inventor holds 31 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignees: Hitachi High-Tech Corporation, Opnext Japan, Inc., Hitachi, Ltd.. Active years: 1998-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunori Shinoda. Retrieved from https://idiyas.com/inventor/kazunori-shinoda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 31 

% Patents Active = 90.3

Average Co-Inventor Count = 5.0

ph-index = 5

Forward Citations = 107(Granted Patents)


Location History:

  • Shiki, JP (1998 - 1999)
  • Tokorozawa, JP (2005 - 2006)
  • Musashino, JP (2008 - 2014)
  • Tokyo, JP (2014 - 2024)

Company Filing History:

goldMedal12 out of 1,398 
 
Hitachi High-Tech Corporation
 patents
silverMedal8 out of 134 
 
Opnext Japan, Inc.
 patents
bronzeMedal5 out of 42,743 
 
Hitachi, Ltd.
 patents
4. 4 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
5. 3 out of 98 
 
Oclaro Japan, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1998-2026

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Areas of Expertise:
Etching Method
Plasma Processing
Wafer Processing
Optical Device
Semiconductor Laser
Vacuum Processing
Plasma Etching
Optoelectronic Device
Integrated Optoelectronics
Optical Module
Modulator Module
Horizontal-Cavity Laser
31 patents (USPTO):Explore Patents
1. 12652977 - Etching method (2026-06-09),
2. 12518975 - Etching method (2026-01-06),
3. 12444618 - Etching method and etching apparatus (2025-10-14),
4. 12237174 - Etching method (2025-02-25),
5. 12051574 - Wafer processing method and plasma processing apparatus (2024-07-30),
6. 11915951 - Plasma processing method (2024-02-27),
7. 11557463 - Vacuum processing apparatus (2023-01-17),
8. 11515167 - Plasma etching method and plasma processing apparatus (2022-11-29),
9. 11276579 - Substrate processing method and plasma processing apparatus (2022-03-15),
10. 11217454 - Plasma processing method and etching apparatus (2022-01-04),
11. 10937635 - Vacuum processing apparatus (2021-03-02),
12. 10872779 - Plasma etching method and plasma etching apparatus (2020-12-22),
13. 10418254 - Etching method and etching apparatus (2019-09-17),
14. 10325781 - Etching method and etching apparatus (2019-06-18),
15. 10290472 - Vacuum processing apparatus (2019-05-14),

Title: Kazunori Shinoda - Innovative Inventor from Tokyo

Introduction: Kazunori Shinoda is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Kazunori Shinoda holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With over two decades of experience in the tech industry, Kazunori Shinoda has worked with leading research institutions and multinational companies to develop cutting-edge solutions that have revolutionized the way we interact with technology.

Collaborations: Throughout his career, Kazunori Shinoda has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Kazunori Shinoda's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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