The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Apr. 28, 2022
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Thi-Thuy-Nga Nguyen, Aichi, JP;
Kenji Ishikawa, Aichi, JP;
Masaru Hori, Aichi, JP;
Kazunori Shinoda, Tokyo, JP;
Hirotaka Hamamura, Tokyo, JP;
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H10D 30/67 (2025.01); H10D 64/66 (2025.01);
U.S. Cl.
CPC ...
H01L 21/32136 (2013.01); H01L 21/32138 (2013.01); H10D 30/6735 (2025.01); H10D 64/667 (2025.01);
Abstract
A continuous or cyclic etching method for etching a metal carbide over a metal nitride is disclosed. The etching method includes the following steps: supplying plasma that is generated from a gas mixture that contains Nand Hand does not contain halogen gases including fluorine, chlorine, bromine, and iodine to a surface of metal carbide on at least a part of the surface, to modify the surface of metal carbide, and removing the modified surface on metal carbide by ion irradiation or by heating.