Tokyo, Japan

Hirotaka Hamamura

USPTO Granted Patents = 22 

 

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Kunitachi, JP (2004)
  • Kodaira, JP (2010 - 2017)
  • Tokyo, JP (2015 - 2023)

Company Filing History:


Years Active: 2004-2025

where 'Filed Patents' based on already Granted Patents

22 patents (USPTO):

Title: Hirotaka Hamamura: Innovator in Etching Techniques and Magnetic Tunnel Junctions

Introduction

Hirotaka Hamamura, based in Tokyo, Japan, is a prolific inventor known for his contributions to the fields of etching techniques and magnetic tunnel junctions. With a total of 21 patents to his name, Hamamura has made significant advancements in semiconductor processing methods, improving the efficiency and yield of various technologies.

Latest Patents

Among his latest innovations, Hamamura developed an etching method that ensures higher uniformity in the etching amount and enhances the yield during etching processing. This technique involves supplying reactive particles containing fluorine and hydrogen, which do not include oxygen, to form a reaction layer on the surface of a film layer containing transition metal nitride. The subsequent step involves heating the film layer to eliminate this reaction layer effectively.

Another significant contribution from Hamamura is related to a method for manufacturing magnetic tunnel junctions. This innovative approach enables the simultaneous removal of oxides from the side walls of a magnetic layer and the formation of a protective film, which is crucial in maintaining the magnetic characteristics. The method includes a plasma etching step utilizing an oxidizing gas to etch a stacked film, followed by the introduction of an organic acid gas and a corresponding precursor gas to form a protective layer.

Career Highlights

Hirotaka Hamamura has had a noteworthy career with essential roles at renowned companies such as Hitachi, Ltd. and Hitachi High-Tech Corporation. His expertise in semiconductor technologies and advancements in manufacturing processes have cemented his reputation in the industry.

Collaborations

Throughout his career, Hamamura has collaborated with accomplished professionals, including Toshiyuki Mine and Yasuhiro Shimamoto. These collaborations have further enriched his work and contributed to innovative breakthroughs in technology.

Conclusion

Hirotaka Hamamura exemplifies the spirit of innovation with his extensive patent portfolio and impactful career in the semiconductor field. His work continues to influence the industry, paving the way for future advancements in etching techniques and magnetic junction technologies.

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