The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Apr. 22, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Kazunori Shinoda, Tokyo, JP;
Hirotaka Hamamura, Tokyo, JP;
Kenji Maeda, Tokyo, JP;
Kenetsu Yokogawa, Tokyo, JP;
Kenji Ishikawa, Aichi, JP;
Masaru Hori, Aichi, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
Provided is an etching technique providing higher uniformity of etching amount and a higher yield of etching processing. An etching method for etching a film layer as a processing object containing nitride of transition metal, the film layer being disposed on a surface of a wafer, includes a step of supplying reactive particles containing fluorine and hydrogen but containing no oxygen to a surface of the film layer to form a reaction layer on the surface of the film layer, and a step of eliminating the reaction layer by heating the film layer.