Kenji Ishikawa

Title: Kenji Ishikawa: Innovator in Etching Technology

Introduction

Kenji Ishikawa is a prominent inventor based in Aichi, Japan. He has made significant contributions to the field of etching technology, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods that enhance the efficiency and effectiveness of etching processes.

Latest Patents

Ishikawa's latest patents include an etching method and an etching apparatus. The first patent describes a method for selective removal of a titanium aluminum carbide film against titanium aluminum nitride films. This method utilizes near atmospheric pressure plasma, which is a rich non-halogen radical source. It produces various radicals, such as NH, H, CH, N, Ar, OH, and O, from argon and liquid vapor for film surface modification. The modified layer can form volatile products that are easily removed by heating. The second patent presents an etching technique that provides higher uniformity of etching amount and a higher yield of etching processing. This method involves etching a film layer containing nitride of transition metal, which is disposed on a surface of a wafer. It includes a step of supplying reactive particles containing fluorine and hydrogen, but no oxygen, to form a reaction layer on the film layer's surface, followed by a step of eliminating the reaction layer through heating.

Career Highlights

Kenji Ishikawa is currently employed at Hitachi High-Tech Corporation, where he continues to develop innovative solutions in etching technology. His work has been instrumental in advancing the capabilities of etching processes, making them more efficient and effective.

Collaborations

Ishikawa collaborates with notable colleagues, including Kazunori Shinoda and Hirotaka Hamamura. Their combined expertise contributes to the development of cutting-edge technologies in their field.

Conclusion

Kenji Ishikawa is a key figure in the realm of etching technology, with a focus on innovative methods that enhance processing efficiency. His contributions through patents and collaborations continue to shape the future of this important field.