Taipei, Taiwan

Kuan-Cheng Su

USPTO Granted Patents = 59 

Average Co-Inventor Count = 3.5

ph-index = 9

Forward Citations = 215(Granted Patents)

Forward Citations (Not Self Cited) = 195(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hsinchu, TW (2009 - 2014)
  • Taipei, TW (1995 - 2021)

Company Filing History:


Years Active: 1995-2025

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Areas of Expertise:
Electrostatic Discharge Protection
Semiconductor Device
Fin Diode Structure
Grounded Gate NMOS Transistor
Complementary Metal-Oxide-Semiconductor
ESD Protection Circuit
Plasma Arcing Sensor
Test Structure
Field Effect Transistor
AC Stress Test Circuit
Source Silicide Pattern
Drain Silicide Pattern
59 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Kuan-Cheng Su

Introduction: Kuan-Cheng Su, a talented inventor hailing from Taipei, Taiwan, has made significant contributions to the world of technology and innovation.

Latest Patents: Kuan-Cheng Su's latest patents include groundbreaking inventions in the field of renewable energy storage systems and advanced semiconductor technologies.

Career Highlights: With a career spanning over two decades, Kuan-Cheng Su has worked tirelessly to develop cutting-edge solutions in the areas of clean energy, telecommunications, and consumer electronics. His innovative approach has led to the successful commercialization of several products that have revolutionized their respective industries.

Collaborations: Throughout his career, Kuan-Cheng Su has collaborated with leading research institutions, universities, and technology companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: In conclusion, Kuan-Cheng Su's passion for innovation and his dedication to pushing the boundaries of technology have established him as a respected figure in the world of inventors. His continued pursuit of excellence promises a future filled with groundbreaking inventions that will shape the world for years to come.

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