The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Apr. 26, 2016
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Mei-Ling Chao, Tainan, TW;

Tien-Hao Tang, Hsinchu, TW;

Kuan-Cheng Su, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 29/417 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0277 (2013.01); H01L 27/027 (2013.01); H01L 27/0248 (2013.01); H01L 27/0251 (2013.01); H01L 27/0255 (2013.01); H01L 27/0259 (2013.01); H01L 27/0262 (2013.01); H01L 27/0274 (2013.01); H01L 29/0619 (2013.01); H01L 29/0626 (2013.01); H01L 29/0692 (2013.01); H01L 29/0843 (2013.01); H01L 29/0847 (2013.01); H01L 29/1083 (2013.01); H01L 29/1087 (2013.01); H01L 29/41725 (2013.01);
Abstract

A layout structure of an ESD protection semiconductor device includes a substrate, a first doped region, a pair of second doped regions, a pair of third doped regions, at least a first gate structure formed within the first doped region, and a drain region and a first source region formed at two sides of the first gate structure. The substrate, the first doped region and the third doped regions include a first conductivity type. The second doped regions, the drain region and the first source region include a second conductivity type complementary to the first conductivity type. The first doped region includes a pair of lateral portions and a pair of vertical portions. The pair of second doped regions is formed under the pair of lateral portions, and the pair of third doped regions is formed under the pair of vertical portions.


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