The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

Nov. 27, 2018
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Shih-Che Yen, Taoyuan, TW;

Tien-Hao Tang, Hsinchu, TW;

Chun Chiang, Hsinchu, TW;

Kuan-Cheng Su, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H02H 9/04 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0266 (2013.01); H01L 27/0255 (2013.01); H02H 9/046 (2013.01);
Abstract

A silicon controlled rectifier includes a substrate, an N-type well, a P-type well, a gate structure, a first N-type doped region, a second N-type doped region, a first P-type doped region, a second P-type doped region, a first STI, and a second STI. The N-type well and the P-type well are disposed in the substrate. The gate structure is disposed on the P-type well. The first N-type doped region is disposed in the N-type well at one side of the gate structure. The second N-type doped region is disposed in the P-type well at another side of the gate structure. The first P-type doped region is disposed in the N-type well. The second P-type doped region is disposed in the P-type well. The first STI is between the first N-type and first P-type doped regions. The second STI is between the second N-type and second P-type doped regions.


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