Company Filing History:

13 out of 641

Kla-tencor Technologies Corporation

patents

6 out of 1,787

Kla Tencor Corporation

patents

2 out of 993

Novellus Systems Incorporated

Years Active: 2001-2022

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22 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11249110 - Resistivity probes with curved portions (2022-02-15),

2. 11043239 - Magneto-optic Kerr effect metrology systems (2021-06-22),

3. 10514391 - Resistivity probe having movable needle bodies (2019-12-24),

4. 9435826 - Variable spacing four-point probe pin device and method (2016-09-06),

5. 8804106 - System and method for nondestructively measuring concentration and thickness of doped semiconductor layers (2014-08-12),

6. 8004290 - Method and apparatus for determining dielectric layer properties (2011-08-23),

7. 7893703 - Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer (2011-02-22),

8. 7719294 - Systems configured to perform a non-contact method for determining a property of a specimen (2010-05-18),

9. 7538333 - Contactless charge measurement of product wafers and control of corona generation and deposition (2009-05-26),

10. 7525304 - Measurement of effective capacitance (2009-04-28),

11. 7397254 - Methods for imperfect insulating film electrical thickness/capacitance measurement (2008-07-08),

12. 7345306 - Corona based charge voltage measurement (2008-03-18),

13. 7248062 - Contactless charge measurement of product wafers and control of corona generation and deposition (2007-07-24),

14. 7187186 - Methods and systems for determining one or more properties of a specimen (2007-03-06),

15. 7110238 - Systems and methods for using non-contact voltage sensors and corona discharge guns (2006-09-19),

Title: **Jianou Shi: Innovator in Resistivity Probes and Metrology Systems**

Introduction

Jianou Shi, based in Milpitas, California, has made significant contributions to the field of technology through his innovative inventions. With an impressive portfolio of 22 patents, Shi has been instrumental in developing advanced solutions that enhance the performance of integrated circuits and metrology systems.

Latest Patents

Among his latest patents, Shi has focused on two notable inventions. The first is a design for resistivity probes with curved portions. These probes are essential tools for testing integrated circuits. The design features a substrate equipped with multiple vias and metal pins, providing efficient electrical connections through interconnects. Specifically, each metal pin is situated within a via and extends outward, facilitating precise measurements. The second patent highlights his work on magneto-optic Kerr effect metrology systems. In this innovation, a laser beam is manipulated using transmissive and reflective axicon telescopes. This system transforms a Gaussian beam profile into a hollowed laser ring, allowing for enhanced measurement capabilities through advanced optical engineering.

Career Highlights

Jianou Shi has established himself professionally by working with leading organizations in the tech industry, notably Kla-Tencor Technologies Corporation and Kla Tencor Corporation. His positions at these companies contributed significantly to his expertise in the development of metrology and testing technologies.

Collaborations

Throughout his career, Shi has collaborated with several prominent professionals, including Shiyou Pei and Sergio Edelstein. These collaborations have undoubtedly enriched his work and have played a role in the advancement of the technologies he has developed.

Conclusion

Jianou Shi's innovative contributions to resistivity probes and metrology systems demonstrate his commitment to advancing technology. With his substantial patent portfolio and collaborations with esteemed colleagues, Shi continues to impact the field of integrated circuit testing and optical measurement techniques. His work exemplifies the spirit of innovation that drives the tech industry forward.

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