logo

For the Inventor, By the Inventor

Tokyo, Japan

Spp Technologies Co., Ltd.

USPTO Granted Patents = 15


Forward Citations = 12

Loading Chart...
Loading Chart...

16 inventors (with patents filed for the assignee):

goldMedal Shoichi Murakami (6 out of 9 patents)

silverMedal Yasuyuki Hayashi (3 out of 3 patents)

bronzeMedal Toshihiro Hayami (3 out of 4 patents)

4.  Masayasu Hatashita (3 out of 5 patents)

5.  Yoshiyuki Nozawa (3 out of 4 patents)

6.  Takashi Yamamoto (3 out of 18 patents)

7.  Hiroshi Taka (2 out of 2 patents)

8.  Masaya Yamawaki (2 out of 4 patents)

9.  Naoya Ikemoto (2 out of 2 patents)

10.  Takeshi Habe (2 out of 2 patents)

11.  Norihiro Tsujioka (2 out of 2 patents)

12.  Ryosuke Fujii (1 out of 3 patents)

13.  Kenichi Tomisaka (1 out of 1 patent)

14.  Akimitsu Oishi (1 out of 3 patents)

15.  Masahiko Tanaka (1 out of 2 patents)


15 patents:

1. 12243210 - Maintenance support system, maintenance support method, program, method for generating processed image, and processed image (2025-03-04),
2. 11785184 - Maintenance support system, maintenance support method, and program (2023-10-10),
3. 11393664 - Substrate placing table, plasma processing apparatus provided with same, and plasma processing method (2022-07-19),
4. 11195697 - Plasma control apparatus (2021-12-07),
5. 10559459 - Method for producing silicon nitride film and silicon nitride film (2020-02-11),
6. 10280084 - Silicon nitride film and method of making thereof (2019-05-07),
7. 10204768 - Etching device, plasma processing device (2019-02-12),
8. 9123542 - Plasma etching method (2015-09-01),
9. 9117660 - Apparatus, method and program for manufacturing nitride film (2015-08-25),
10. 8859434 - Etching method (2014-10-14),
11. 8852388 - Plasma processor (2014-10-07),
12. 8771461 - Plasma processing apparatus (2014-07-08),
13. 8628676 - Plasma etching method (2014-01-14),
14. 8546265 - Method, apparatus and program for manufacturing silicon structure (2013-10-01),
15. 8518283 - Plasma etching method capable of detecting end point and plasma etching device therefor (2013-08-27),
Company Overview
Spp Technologies Co., Ltd. is a Tokyo-based company specializing in advanced technology solutions across various sectors. The organization focuses on the development and manufacturing of innovative products, particularly in the fields of telecommunications and information technology. With a commitment to research and development, Spp Technologies aims to enhance connectivity and efficiency through cutting-edge technologies, contributing to the digital transformation landscape in Japan and beyond.
Profile summary synthesized from public USPTO records and patent filings.

logo

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

15 Patents

#1,541 in Tokyo

#3,447 in Japan

#39,959 in the World

Tokyo, JP
Tokyo, Japan

Spp Technologies Co., Ltd.

Forward Citations = 12

16 inventors:

goldMedal Shoichi Murakami (6 out of 9 patents)

silverMedal Yasuyuki Hayashi (3 out of 3 patents)

bronzeMedal Toshihiro Hayami (3 out of 4 patents)

4.  Masayasu Hatashita (3 out of 5 patents)

5.  Yoshiyuki Nozawa (3 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Spp Technologies Co., Ltd.. Retrieved from https://idiyas.com/company/spp-technologies-company

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…