Location History:
- Tokyo, JP (2019)
- Kawasaki, JP (2020)
Company Filing History:
2 out of 144 
2 out of 15 Years Active: 2019-2020
Title: Hiroshi Taka: Innovator in Silicon Nitride Film Technology
Introduction
Hiroshi Taka is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon nitride films. With a total of two patents to his name, Taka's work focuses on enhancing the properties of silicon nitride films for various applications.
Latest Patents
Hiroshi Taka's latest patents include a method for producing silicon nitride film and the silicon nitride film itself. One of the key objectives of his first patent is to provide a method for producing a silicon nitride film that exhibits high hydrofluoric acid resistance, high moisture resistance, and appropriate internal stress on a substrate maintained at a temperature of 250°C or lower. This method utilizes a plasma chemical vapor deposition technique, employing a processing gas that combines a hydrogen reducing gas with an organosilane gas. The process is conducted under specific pressure and high-frequency electric power conditions to achieve optimal results. His second patent focuses on reducing the carbon and/or hydrogen atom content ratio in silicon nitride films formed by a plasma CVD method. This innovation aims to improve the film quality, particularly its electrical properties, by using organic silane and additive gases.
Career Highlights
Throughout his career, Hiroshi Taka has worked with prominent companies such as Taiyo Nippon Sanso Corporation and SPP Technologies Co., Ltd. His experience in these organizations has contributed to his expertise in the field of silicon nitride film technology.
Collaborations
Hiroshi Taka has collaborated with notable coworkers, including Masaya Yamawaki and Shoichi Murakami. Their combined efforts have further advanced the research and development of innovative materials.
Conclusion
Hiroshi Taka's contributions to the field of silicon nitride films demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and a drive to improve the performance of silicon nitride films for various applications.