Company Filing History:
Years Active: 2014-2015
Title: Naoya Ikemoto: Innovator in Plasma Etching Technology
Introduction
Naoya Ikemoto is a prominent inventor based in Hyogo, Japan, known for his contributions to plasma etching technology. With a total of two patents to his name, Ikemoto has made significant advancements in the field of semiconductor processing.
Latest Patents
Ikemoto's latest patents include a plasma etching method that forms a tapered recess portion in a wide-gap semiconductor substrate. This method involves creating an etching film on the substrate that has a higher etching speed than the substrate itself. A mask with an opening is then formed on this high-speed etching film. The substrate, along with the etching film and mask, is heated to a temperature of 200 °C or higher, where plasma is generated from an etching gas in a processing chamber. A bias potential is applied to the platen to facilitate the etching process.
Another notable patent by Ikemoto is a plasma etching method capable of forming a tapering etching structure with a smooth surface. This method utilizes a fluorine-containing gas and a nitrogen gas, generating plasma from both gases simultaneously. The silicon substrate is etched by the plasma while an etch-resistant layer is formed on it. Subsequently, a fluorine-containing gas and an oxygen-containing gas are used, generating plasma from these gases to further etch the silicon substrate, resulting in a tapering etching structure with a wide top opening and a narrow bottom width.
Career Highlights
Ikemoto is currently employed at SPP Technologies Co., Ltd., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing plasma etching methods, which are crucial for the fabrication of modern electronic devices.
Collaborations
Ikemoto has collaborated with notable colleagues, including Shoichi Murakami and Takashi Yamamoto, contributing to various projects that enhance the capabilities of plasma etching technology.
Conclusion
Naoya Ikemoto's contributions to plasma etching technology have positioned him as a key figure in the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in this critical field.