The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Jan. 20, 2017
Spp Technologies Co., Ltd., Tokyo, JP;
Toshihiro Hayami, Hyogo, JP;
Ryosuke Fujii, Hyogo, JP;
SPP TECHNOLOGIES CO., LTD., Tokyo, JP;
Abstract
A plasma control apparatus includes a power source unit, a resonance producing unit, and a voltmeter. The resonance producing unit includes an LC circuit formed by a coil Land a capacitor Cconnected to each other, and a sensor Sconfigured to detect a phase difference between current flowing in and voltage applied to the LC circuit, and the capacitor Cof the LC circuit has a capacitance larger than an expected capacitance of the plasma P. The power source unitconfigured to control the magnitude of radio-frequency power to be supplied in such a manner as to bring the voltage measured with the voltmeterclose to a set voltage as a target, and controls the frequency of the radio-frequency power to be supplied in such a manner as to minimize the phase difference detected with the sensor S