The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Feb. 26, 2008
Toshihiro Hayami, Amagasaki, JP;
Toshihiro Hayami, Amagasaki, JP;
SPP Technologies Co., Ltd., Tokyo, JP;
Abstract
The present invention relates to a plasma processor capable of regulating the temperature of the inner surface of the processing chamber efficiently and with excellent response, with a low-cost configuration. A plasma processorincludes a processing chamber, a processing gas supply device, an exhaust device, coils, a high-frequency power supply unit, a heater, a cooling device, and a control device. The cooling deviceis configured with a cooling memberfacing the processing chamberat a distance therefrom, a cooling fluid supply sectionfor supplying cooling fluid into a cooling passageof the cooling memberand circulates it, and annular seal membersandprovided between the cooling memberand the processing chamber. The exhaust devicereduces the pressure in a space S surrounded by the seal membersand, the cooling member, and the processing chamber. The control devicecontrols the exhaust deviceto reduce the pressure in the space S when high-frequency power is not applied to the coils, and to set the pressure in the space S at atmospheric pressure when high-frequency power is applied to the coils