Yoshiyuki Nozawa

Title: The Innovative Contributions of Yoshiyuki Nozawa

Introduction

Yoshiyuki Nozawa is a prominent inventor based in Amagasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in plasma etching technologies. With a total of four patents to his name, Nozawa's work has advanced the capabilities of silicon structure fabrication.

Latest Patents

One of his latest patents is a plasma etching method that enables the formation of a tapering etching structure with a smooth surface. This method utilizes a combination of fluorine-containing gas and nitrogen gas, generating plasma from these gases simultaneously. The process allows for the etching of a silicon substrate while forming an etch-resistant layer, resulting in a tapering structure with a wide top opening and a narrow bottom width. Another notable patent is a method, apparatus, and program for manufacturing silicon structures. This invention involves a dry-etching process that employs gas-switching, allowing for precise control over the etching rate and ensuring that the silicon region does not reach the etch stop layer.

Career Highlights

Throughout his career, Yoshiyuki Nozawa has worked with several notable companies, including SPP Technologies Co., Ltd. and Sumitomo Precision Products Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovation.

Collaborations

Nozawa has collaborated with esteemed colleagues such as Takashi Yamamoto and Masahiko Tanaka. These partnerships have fostered a collaborative environment that has led to further advancements in their respective fields.

Conclusion

Yoshiyuki Nozawa's innovative work in plasma etching and silicon structure manufacturing has made a lasting impact on the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.