This inventor holds 3 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignee: Spp Technologies Co., Ltd.. Active years: 2014-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Amagasaki, JP (2014)
- Hyogo, JP (2019 - 2022)
Company Filing History:
Years Active: 2014-2022
Title: Yasuyuki Hayashi: Innovator in Plasma Processing Technology
Introduction
Yasuyuki Hayashi is a prominent inventor based in Hyogo, Japan, known for his contributions to plasma processing technology. With a total of three patents to his name, he has made significant advancements in the field, particularly in the design and functionality of substrate placing tables and plasma processing devices.
Latest Patents
Hayashi's latest patents include a substrate placing table, a plasma processing apparatus, and a plasma processing method. The substrate placing table is designed to minimize the influence of external factors, such as temperature variations within a chamber. This innovative table features an electrostatic chuck and a cooling jacket, with the electrostatic chuck comprising an upper disk part that incorporates an electrode for electrostatic attraction and a lower disk part that houses a heater. Additionally, the design includes a focus ring and thermal insulation covers made of ceramics to enhance performance.
His plasma processing device is engineered to position a protective member with high accuracy, ensuring optimal coverage of the substrate's peripheral edge. This device includes a platen for substrate placement, a gas supply system, a plasma generating unit, and a lifting cylinder for precise adjustments.
Career Highlights
Yasuyuki Hayashi has established himself as a key figure in the field of plasma processing technology through his innovative designs and patents. His work at SPP Technologies Co., Ltd. has allowed him to push the boundaries of what is possible in plasma processing applications.
Collaborations
Hayashi collaborates with notable colleagues, including Kenichi Tomisaka and Toshihiro Hayami, who contribute to the development and refinement of his inventions.
Conclusion
Yasuyuki Hayashi's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving the efficiency and effectiveness of plasma processing systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile