The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Jan. 09, 2019
Spp Technologies Co., Ltd., Tokyo, JP;
Yasuyuki Hayashi, Hyogo, JP;
SPP TECHNOLOGIES CO., LTD., Tokyo, JP;
Abstract
Provided is a substrate placing table () capable of reducing influences of external factors such as the temperature inside a chamber (). The substrate placing table () disposed in the chamber () in a plasma processing apparatus () includes an electrostatic chuck () and a cooling jacket (), and the electrostatic chuck () consists of an upper disk part () having an electrode () for electrostatic attraction incorporated therein, and a lower disk part () having a greater diameter than the upper disk part () and having a heater () incorporated therein. A focus ring () disposed outside the upper disk part () in a radial direction of the upper disk part () and covering an upper surface of the lower disk part (), an upper annular cover () for thermal insulation enclosing the lower disk part () and at least a part of the cooling jacket (), and a lower annular cover () for thermal insulation clamping the cooling jacket () between itself and the upper annular cover () are made of ceramics.